📣 Milestone moment for Intel... Europe's first high volume EUV scanner has arrived! This system, made by Dutch manufacturer ASML, is arguably the most complicated piece of machinery humans have ever built and it heralds an important moment for our new €17 billion fab development in Ireland. https://intel.ly/37msdgP | Intel
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📣 Milestone moment for Intel... Europe's first high volume EUV scanner has arrived! This system, made by Dutch manufacturer ASML, is arguably the most complicated piece of machinery humans have ever built and it heralds an important moment for our new €17 billion fab development in Ireland. https://intel.ly/37msdgP | Intel
11.3K viewsApr 7, 2022
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ASML Developing Next-Gen EUV Lithography
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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN曝光機中的晶圓平台（Wafer Stage）是微影設備中關鍵的定位模組（Positioning Module），在系統設計上整合機械電子學、光學設計及量測學（包含量測、數據處理及控制）。雙晶圓平台能在同一時間移動兩片矽晶圓：其中右邊的晶圓曝光於EUV極紫外光下，將電路設計圖影像（Pattern）刻在晶圓上；左邊的晶圓同時由機台的量測儀器優化其準確度（Alignment）。兩個平台交替執行微影和量測功能，並以電磁的方式移動，在無摩擦力的作用下能加速至7G❗️ 這就是ASML的微影系統如何在晶片量產時得以兼顧準確性及生產速度的關鍵。⚡️ #ASML #EUV #WaferStage | ASML
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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN曝光機中的晶圓平台（Wafer Stage）是微影設備中關鍵的定位模組（Positioning Module），在系統設計上整合機械電子學、光學設計及量測學（包含量測、數據處理及控制）。雙晶圓平台能在同一時間移動兩片矽晶圓：其中右邊的晶圓曝光於EUV極紫外光下，將電路設計圖影像（Pattern）刻在晶圓上；左邊的晶圓同時由機台的量測儀器優化其準確度（Alignment）。兩個平台交替執行微影和量測功能，並以電磁的方式移動，在無摩擦力的作用下能加速至7G❗️ 這就是ASML的微影系統如何在晶片量產時得以兼顧準確性及生產速度的關鍵。⚡️ #ASML #EUV #WaferStage | ASML
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【ASML創新小學堂｜微影設備的感測器與致動器🙌】 ​ 你知道嗎？在微影設備中，有數以千計、非常小又精細的感測器和致動器，它們幾乎負責一切的測量，甚至能測出光在零件中穿梭的速度！而先進的演算法可以幫助我們解讀來自這些感測器的數據，以進行適當調整、優化機台的運作。今天我們的Senior software architect──Lewis Binns將為各位解釋微影設備的感測器與致動器👏 ​ 「如果沒有它們，今天所有的智能產品將不復存在。」Lewis以曝光機(scanner)來進一步說明：曝光儀內部非常繁忙，像是每小時測量與曝光數百個晶圓、零件以高達16g的加速度來回移動，零件被反覆加熱和冷卻，各式各樣的感測器用來連續測量曝光機零件、晶圓和光罩的位置及溫度等。 ⬇ 再來會使用我們開發的量測系統處理這些感測器的測量結果，以確定致動器的最佳設置。 ⬇ 曝光機中有數千個規模和性能不同的致動器，一端是用於移動晶圓的機械手臂與平台；另一端可能會在一個透鏡上安裝數百個壓電致動器，用於像是改變其形狀並優化所產生的投影圖案。 ⬇ 再來就需要量測軟體工程師的協助了，他們對於系統具備詳細的瞭解，並致力於融
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